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    Microstructure formation in electrochemically deposited Copper thin films

    New search for: Kremmer, K.
    New search for: Yezerska, O.
    New search for: Schreiber, G.
    New search for: Masimov, M.
    New search for: Klemm, V.
    New search for: Schneider, M.
    New search for: Rafaja, D.

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    Microstructure formation in electrochemically deposited Copper thin films

    New search for: Kremmer, K.
    New search for: Yezerska, O.
    New search for: Schreiber, G.
    New search for: Masimov, M.
    New search for: Klemm, V.
    New search for: Schneider, M.
    New search for: Rafaja, D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Microstructure formation in electrochemically deposited Copper thin films

    New search for: Kremmer, K.
    New search for: Yezerska, O.
    New search for: Schreiber, G.
    New search for: Masimov, M.
    New search for: Klemm, V.
    New search for: Schneider, M.
    New search for: Rafaja, D.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Microstructure formation in electrochemically deposited Copper thin films

    Contributors:

    Kremmer, K. (author) / Yezerska, O. (author) / Schreiber, G. (author) / Masimov, M. (author) / Klemm, V. (author) / Schneider, M. (author) / Rafaja, D. (author)

    Published in:

    MATERIALWISSENSCHAFT UND WERKSTOFFTECHNIK ; 38 ; 121-124

    Publication date:

    2007-01-01

    Size:

    4 pages

    ISSN:

    0933-5137

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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