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A platform for research: civil engineering, architecture and urbanism
Equipment and method for arranging VAD and OVD
The invention discloses equipment and method for arranging a VAD and an OVD. The equipment comprises a multi-storey plant and a deposition tower penetrating through all storeys from bottom to top. A pedestal of the deposition tower is arranged on the first storey of the plant, and the top of the deposition tower reaches but does not make contact with the top of the plant. A VAD device body or an OVD device body is suspended in the space of each storey through the deposition tower, and the device bodies are suspended on the deposition tower in a spiral arraying mode from the first storey to the top storey. VAD auxiliary devices or OVD auxiliary devices are installed on the storeys of the corresponding VAD device bodies or the OVD device bodies, and the VAD auxiliary devices or OVD auxiliary devices surround the deposition tower. The equipment improves the utilization efficiency of the deposition tower, improves the utilization rate of the plant, improves the utilization rate of clean space of the plant and lowers the cost.
Equipment and method for arranging VAD and OVD
The invention discloses equipment and method for arranging a VAD and an OVD. The equipment comprises a multi-storey plant and a deposition tower penetrating through all storeys from bottom to top. A pedestal of the deposition tower is arranged on the first storey of the plant, and the top of the deposition tower reaches but does not make contact with the top of the plant. A VAD device body or an OVD device body is suspended in the space of each storey through the deposition tower, and the device bodies are suspended on the deposition tower in a spiral arraying mode from the first storey to the top storey. VAD auxiliary devices or OVD auxiliary devices are installed on the storeys of the corresponding VAD device bodies or the OVD device bodies, and the VAD auxiliary devices or OVD auxiliary devices surround the deposition tower. The equipment improves the utilization efficiency of the deposition tower, improves the utilization rate of the plant, improves the utilization rate of clean space of the plant and lowers the cost.
Equipment and method for arranging VAD and OVD
SHEN XIAOPING (author) / XIANG DECHENG (author) / LANG XIAO (author) / QIAN KUN (author) / SHEN GUOFENG (author) / HE CHENGCHENG (author)
2015-06-24
Patent
Electronic Resource
English
IPC:
E04H
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