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    Gallium nitride molded article, method for producing same, and gallium nitride sputtering target

    New search for: MESUDA MASAMI
    New search for: MATSUMARU KEITARO
    New search for: TAKAHASHI KOYATA
    New search for: KIKUCHI RYOU
    New search for: SHIBUTAMI TETSUO

    The present invention provides a gallium nitride molded article which have high density and low oxygen content without using a special apparatus, a method for producing the same and a gallium nitride sputtering target. According to the second embodiment, a metal gallium-impregnated gallium nitride molded article, which is characterized by comprising a gallium nitride phase and a metal gallium phase that exist as separate phases and having a molar ratio, Ga/(Ga + N), of 55% to 80%, can be obtained.

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    Gallium nitride molded article, method for producing same, and gallium nitride sputtering target

    New search for: MESUDA MASAMI
    New search for: MATSUMARU KEITARO
    New search for: TAKAHASHI KOYATA
    New search for: KIKUCHI RYOU
    New search for: SHIBUTAMI TETSUO

    The present invention provides a gallium nitride molded article which have high density and low oxygen content without using a special apparatus, a method for producing the same and a gallium nitride sputtering target. According to the second embodiment, a metal gallium-impregnated gallium nitride molded article, which is characterized by comprising a gallium nitride phase and a metal gallium phase that exist as separate phases and having a molar ratio, Ga/(Ga + N), of 55% to 80%, can be obtained.

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    Download

    Gallium nitride molded article, method for producing same, and gallium nitride sputtering target

    New search for: MESUDA MASAMI
    New search for: MATSUMARU KEITARO
    New search for: TAKAHASHI KOYATA
    New search for: KIKUCHI RYOU
    New search for: SHIBUTAMI TETSUO

    The present invention provides a gallium nitride molded article which have high density and low oxygen content without using a special apparatus, a method for producing the same and a gallium nitride sputtering target. According to the second embodiment, a metal gallium-impregnated gallium nitride molded article, which is characterized by comprising a gallium nitride phase and a metal gallium phase that exist as separate phases and having a molar ratio, Ga/(Ga + N), of 55% to 80%, can be obtained.

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    Document information
    Title:

    Gallium nitride molded article, method for producing same, and gallium nitride sputtering target

    Contributors:

    MESUDA MASAMI (author) / MATSUMARU KEITARO (author) / TAKAHASHI KOYATA (author) / KIKUCHI RYOU (author) / SHIBUTAMI TETSUO (author)

    Publication date:

    2016-02-24

    Type of media:

    Patent

    Type of material:

    Electronic Resource

    Language:

    English

    Classification:

    IPC:  C04B Kalk , LIME / C22C Legierungen , ALLOYS / C23C Beschichten metallischer Werkstoffe , COATING METALLIC MATERIAL

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