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    Gallium nitride molded article, method for producing same, and gallium nitride sputtering target

    Neue Suche nach: MESUDA MASAMI
    Neue Suche nach: MATSUMARU KEITARO
    Neue Suche nach: TAKAHASHI KOYATA
    Neue Suche nach: KIKUCHI RYOU
    Neue Suche nach: SHIBUTAMI TETSUO

    The present invention provides a gallium nitride molded article which have high density and low oxygen content without using a special apparatus, a method for producing the same and a gallium nitride sputtering target. According to the second embodiment, a metal gallium-impregnated gallium nitride molded article, which is characterized by comprising a gallium nitride phase and a metal gallium phase that exist as separate phases and having a molar ratio, Ga/(Ga + N), of 55% to 80%, can be obtained.

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    Gallium nitride molded article, method for producing same, and gallium nitride sputtering target

    Neue Suche nach: MESUDA MASAMI
    Neue Suche nach: MATSUMARU KEITARO
    Neue Suche nach: TAKAHASHI KOYATA
    Neue Suche nach: KIKUCHI RYOU
    Neue Suche nach: SHIBUTAMI TETSUO

    The present invention provides a gallium nitride molded article which have high density and low oxygen content without using a special apparatus, a method for producing the same and a gallium nitride sputtering target. According to the second embodiment, a metal gallium-impregnated gallium nitride molded article, which is characterized by comprising a gallium nitride phase and a metal gallium phase that exist as separate phases and having a molar ratio, Ga/(Ga + N), of 55% to 80%, can be obtained.

    Zugriff

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    Gallium nitride molded article, method for producing same, and gallium nitride sputtering target

    Neue Suche nach: MESUDA MASAMI
    Neue Suche nach: MATSUMARU KEITARO
    Neue Suche nach: TAKAHASHI KOYATA
    Neue Suche nach: KIKUCHI RYOU
    Neue Suche nach: SHIBUTAMI TETSUO

    The present invention provides a gallium nitride molded article which have high density and low oxygen content without using a special apparatus, a method for producing the same and a gallium nitride sputtering target. According to the second embodiment, a metal gallium-impregnated gallium nitride molded article, which is characterized by comprising a gallium nitride phase and a metal gallium phase that exist as separate phases and having a molar ratio, Ga/(Ga + N), of 55% to 80%, can be obtained.

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    Titel:

    Gallium nitride molded article, method for producing same, and gallium nitride sputtering target

    Beteiligte:

    MESUDA MASAMI (Autor:in) / MATSUMARU KEITARO (Autor:in) / TAKAHASHI KOYATA (Autor:in) / KIKUCHI RYOU (Autor:in) / SHIBUTAMI TETSUO (Autor:in)

    Erscheinungsdatum:

    24.02.2016

    Medientyp:

    Patent

    Format:

    Elektronische Ressource

    Sprache:

    Englisch

    Klassifikation:

    IPC:  C04B Kalk , LIME / C22C Legierungen , ALLOYS / C23C Beschichten metallischer Werkstoffe , COATING METALLIC MATERIAL

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