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Indium tin zinc oxide target material, oxide film and preparation method thereof
The invention discloses an indium tin zinc oxide target material, an oxide film and a preparation method and application thereof. The indium tin zinc oxide target material comprises In, Sn, Zn and O, the atomic molar ratio of In to Sn to Zn is 0.6988: M + N: N, and M is larger than 0 and smaller than or equal to 0.0199; n is more than 0 and less than 0.33945; the relative density of the indium tin zinc oxide target material is greater than 99%. The oxide film prepared by adopting the indium tin zinc oxide target material is low in surface roughness, has no significant change in film transmittance and resistance compared with the indium tin oxide target material, and has wide application value.
本发明公开了一种氧化铟锡锌靶材、氧化物薄膜及其制备方法与应用。本发明的氧化铟锡锌靶材包含In、Sn、Zn、O，以原子摩尔比计In：Sn：Zn＝0.6988：M+N：N，其中，所述M满足0＜M≤0.0199；所述N满足0＜N＜0.33945；所述氧化铟锡锌靶材的相对密度大于99％。采用本发明的氧化铟锡锌靶材制得的氧化物薄膜表面粗糙度低，相对于氧化铟锡靶材其膜层透过率和电阻无显著性变化，具有广泛的应用价值。
Indium tin zinc oxide target material, oxide film and preparation method thereof
The invention discloses an indium tin zinc oxide target material, an oxide film and a preparation method and application thereof. The indium tin zinc oxide target material comprises In, Sn, Zn and O, the atomic molar ratio of In to Sn to Zn is 0.6988: M + N: N, and M is larger than 0 and smaller than or equal to 0.0199; n is more than 0 and less than 0.33945; the relative density of the indium tin zinc oxide target material is greater than 99%. The oxide film prepared by adopting the indium tin zinc oxide target material is low in surface roughness, has no significant change in film transmittance and resistance compared with the indium tin oxide target material, and has wide application value.
本发明公开了一种氧化铟锡锌靶材、氧化物薄膜及其制备方法与应用。本发明的氧化铟锡锌靶材包含In、Sn、Zn、O，以原子摩尔比计In：Sn：Zn＝0.6988：M+N：N，其中，所述M满足0＜M≤0.0199；所述N满足0＜N＜0.33945；所述氧化铟锡锌靶材的相对密度大于99％。采用本发明的氧化铟锡锌靶材制得的氧化物薄膜表面粗糙度低，相对于氧化铟锡靶材其膜层透过率和电阻无显著性变化，具有广泛的应用价值。
Indium tin zinc oxide target material, oxide film and preparation method thereof
一种氧化铟锡锌靶材、氧化物薄膜及其制备方法
CHEN MINGFEI (author) / LIU YONGCHENG (author) / WANG JINKE (author) / GUO ZIXUAN (author) / XU SHENGLI (author) / CHEN MINGGAO (author) / JIANG CHANGJIU (author) / WANG ZHIJIE (author) / MO GUOREN (author) / LI YUEHUI (author)
2022-12-02
Patent
Electronic Resource
Chinese
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