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Preparation method of high-density tin tantalum oxide target material
The invention relates to the technical field of target materials, in particular to a preparation method of a high-density tin tantalum oxide target material, the preparation method comprises three steps of powder preparation, target material sintering and target material forming, and the relative density of the target material is improved by introducing tantalum and strictly regulating parameters in each step. The relative density of the prepared high-density tin oxide target material can reach 98.55%, the extremely high relative density is beneficial for the target material to bear thermal stress in the sputtering process, the service life of the target material is prolonged, and the application range of the target material is widened.
本发明涉及靶材技术领域，具体涉及一种高密度氧化锡钽靶材的制备方法，所述制备方法包括粉末制备、靶材烧结和靶材成型三个步骤，通过钽的引入和各个步骤中参数的严格调控实现了靶材相对密度的提高，制备的高密度氧化锡坦靶材的相对密度可以达到98.55％，极高的相对密度有助于靶材承受溅射过程中的热应力，提高靶材的寿命和应用范围。
Preparation method of high-density tin tantalum oxide target material
The invention relates to the technical field of target materials, in particular to a preparation method of a high-density tin tantalum oxide target material, the preparation method comprises three steps of powder preparation, target material sintering and target material forming, and the relative density of the target material is improved by introducing tantalum and strictly regulating parameters in each step. The relative density of the prepared high-density tin oxide target material can reach 98.55%, the extremely high relative density is beneficial for the target material to bear thermal stress in the sputtering process, the service life of the target material is prolonged, and the application range of the target material is widened.
本发明涉及靶材技术领域，具体涉及一种高密度氧化锡钽靶材的制备方法，所述制备方法包括粉末制备、靶材烧结和靶材成型三个步骤，通过钽的引入和各个步骤中参数的严格调控实现了靶材相对密度的提高，制备的高密度氧化锡坦靶材的相对密度可以达到98.55％，极高的相对密度有助于靶材承受溅射过程中的热应力，提高靶材的寿命和应用范围。
Preparation method of high-density tin tantalum oxide target material
一种高密度氧化锡钽靶材的制备方法
WANG ZHIQIANG (author) / WANG TAO (author) / ZENG DUNFENG (author) / ZENG TAN (author) / CHEN GUANGYUAN (author)
2023-09-29
Patent
Electronic Resource
Chinese
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