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Low-zirconium-content indium cerium tantalum titanium oxide target material and preparation method thereof
The invention belongs to the technical field of preparation of oxide targets, and discloses a low-zirconium-content indium cerium tantalum titanium oxide target and a preparation method thereof. The preparation method comprises the following steps: weighing indium oxide powder, cerium oxide powder, tantalum oxide powder and titanium oxide powder according to a mass ratio of (98.73-99.42): (0.43-0.19): (0.64-0.30): (0.20-0.09), adding the cerium oxide powder, the tantalum oxide powder and the titanium oxide powder into a dispersant aqueous solution, dispersing and grinding to obtain slurry I, then adding the indium oxide powder, dispersing and grinding to obtain slurry II, and then adding a binder, dispersing and grinding to obtain slurry III; through spray granulation, mixing and screening, mixed oxide powder is obtained and subjected to dry pressing and cold isostatic pressing, finally heat treatment is conducted, and the low-zirconium-content indium cerium tantalum titanium oxide target material is obtained. According to the invention, the relative density of the target material can be obviously improved and the zirconium content brought by grinding of the target material can be reduced by limiting the composition proportion of each oxide powder and matching with a specific preparation process.
本发明属于氧化物靶材制备技术领域，公开了一种低锆含量氧化铟铈钽钛靶材及其制备方法。所述制备方法为：按质量比为98.73～99.42:0.43～0.19:0.64～0.30:0.20～0.09称取氧化铟、氧化铈、氧化钽和氧化钛粉末，将氧化铈、氧化钽和氧化钛粉末加入到分散剂水溶液中分散研磨，得到浆料一，然后加入氧化铟粉末分散研磨，得到浆料二，再加入粘结剂分散研磨得到浆料三；通过喷雾造粒，混料和筛分，得到混合氧化物粉末经干压和冷等静压，最后热处理，得到低锆含量氧化铟铈钽钛靶材。本发明通过限定各氧化物粉末的成分配比及配合特定的制备工艺，可显著提高靶材的相对密度和降低靶材因研磨带入的锆含量。
Low-zirconium-content indium cerium tantalum titanium oxide target material and preparation method thereof
The invention belongs to the technical field of preparation of oxide targets, and discloses a low-zirconium-content indium cerium tantalum titanium oxide target and a preparation method thereof. The preparation method comprises the following steps: weighing indium oxide powder, cerium oxide powder, tantalum oxide powder and titanium oxide powder according to a mass ratio of (98.73-99.42): (0.43-0.19): (0.64-0.30): (0.20-0.09), adding the cerium oxide powder, the tantalum oxide powder and the titanium oxide powder into a dispersant aqueous solution, dispersing and grinding to obtain slurry I, then adding the indium oxide powder, dispersing and grinding to obtain slurry II, and then adding a binder, dispersing and grinding to obtain slurry III; through spray granulation, mixing and screening, mixed oxide powder is obtained and subjected to dry pressing and cold isostatic pressing, finally heat treatment is conducted, and the low-zirconium-content indium cerium tantalum titanium oxide target material is obtained. According to the invention, the relative density of the target material can be obviously improved and the zirconium content brought by grinding of the target material can be reduced by limiting the composition proportion of each oxide powder and matching with a specific preparation process.
本发明属于氧化物靶材制备技术领域，公开了一种低锆含量氧化铟铈钽钛靶材及其制备方法。所述制备方法为：按质量比为98.73～99.42:0.43～0.19:0.64～0.30:0.20～0.09称取氧化铟、氧化铈、氧化钽和氧化钛粉末，将氧化铈、氧化钽和氧化钛粉末加入到分散剂水溶液中分散研磨，得到浆料一，然后加入氧化铟粉末分散研磨，得到浆料二，再加入粘结剂分散研磨得到浆料三；通过喷雾造粒，混料和筛分，得到混合氧化物粉末经干压和冷等静压，最后热处理，得到低锆含量氧化铟铈钽钛靶材。本发明通过限定各氧化物粉末的成分配比及配合特定的制备工艺，可显著提高靶材的相对密度和降低靶材因研磨带入的锆含量。
Low-zirconium-content indium cerium tantalum titanium oxide target material and preparation method thereof
一种低锆含量氧化铟铈钽钛靶材及其制备方法
LI KAIJIE (author) / SHAO XUELIANG (author) / LUO SISHI (author) / GU DESHENG (author) / ZHANG XINGYU (author)
2023-10-03
Patent
Electronic Resource
Chinese
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