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Sintered body, method for producing sintered body, starting material powder for sintered body, and sintered body
The present invention provides at least one of: a zirconia sintered body that does not exhibit coloration derived from ceria and exhibits high impact resistance; a starting material powder for the zirconia sintered body; a pre-sintered body; and a method for producing the sintered body. The sintered body contains zirconium oxide containing a stabilizing element and germanium oxide, and when the amount of the stabilizing element in the zirconium oxide is Xmol% and the amount of the germanium oxide is Ymol%, Y/X is 0.35 or more and X + Y is 4.0 or less.
本发明提供氧化锆的烧结体、其原料粉末、预烧体以及烧结体的制造方法中的至少任一者,所述氧化锆的烧结体没有源自二氧化铈的显色,且显示出高耐冲击性。一种烧结体,其包含含有稳定化元素的氧化锆,且包含氧化锗,在将该氧化锆中的稳定化元素量设为Xmol%,将氧化锗量设为Ymol%时,Y/X为0.35以上且X+Y为4.0以下。
Sintered body, method for producing sintered body, starting material powder for sintered body, and sintered body
The present invention provides at least one of: a zirconia sintered body that does not exhibit coloration derived from ceria and exhibits high impact resistance; a starting material powder for the zirconia sintered body; a pre-sintered body; and a method for producing the sintered body. The sintered body contains zirconium oxide containing a stabilizing element and germanium oxide, and when the amount of the stabilizing element in the zirconium oxide is Xmol% and the amount of the germanium oxide is Ymol%, Y/X is 0.35 or more and X + Y is 4.0 or less.
本发明提供氧化锆的烧结体、其原料粉末、预烧体以及烧结体的制造方法中的至少任一者,所述氧化锆的烧结体没有源自二氧化铈的显色,且显示出高耐冲击性。一种烧结体,其包含含有稳定化元素的氧化锆,且包含氧化锗,在将该氧化锆中的稳定化元素量设为Xmol%,将氧化锗量设为Ymol%时,Y/X为0.35以上且X+Y为4.0以下。
Sintered body, method for producing sintered body, starting material powder for sintered body, and sintered body
烧结体、烧结体的制造方法、烧结体的原料粉末和预烧体
KAWAMURA KENTA (author) / HOSOI KOHEI (author) / NAGAYAMA HITOSHI (author)
2024-04-26
Patent
Electronic Resource
Chinese
European Patent Office | 2023
|European Patent Office | 2023
|European Patent Office | 2023
|European Patent Office | 2024
|European Patent Office | 2023
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