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Silicon nitride ceramic with high toughness and high hardness as well as preparation method and application thereof
The invention belongs to the technical field of non-oxide-based materials, and discloses high-toughness and high-hardness silicon nitride ceramic as well as a preparation method and application thereof. The method comprises the following steps: introducing a sintering aid MgO-Re2O3 into alpha-Si3N4 powder, mixing, drying to obtain mixed powder of alpha-Si3N4-MgO-Re2O3, putting the mixed powder into a discharge plasma sintering furnace mold, heating to 1700-1800 DEG C under a nitrogen atmosphere of 1 atm, pre-sintering, and keeping the temperature for 1-3 minutes at the pre-sintering pressure of 1-10 MPa; and cooling to 1500-1600 DEG C, sintering under the sintering pressure of 30-50 MPa, and keeping the temperature for 5-20 minutes to obtain the silicon nitride ceramic. According to the invention, a two-step spark plasma sintering process of high-temperature pre-sintering and low-temperature sintering is adopted, so that preparation of the high-performance silicon nitride ceramic is realized. The silicon nitride ceramic has high toughness and high hardness, and can be applied to the field of cutting tools.
本发明属于非氧化物基材料技术领域，公开了一种具有高韧性和高硬度的氮化硅陶瓷及其制备方法和应用。该方法通过向α‑Si3N4粉中引入烧结助剂MgO‑Re2O3经混料，干燥后得到α‑Si3N4‑MgO‑Re2O3的混合粉体，将混合粉体放入放电等离子烧结炉模具后，在1atm的氮气气氛下，先升温至1700～1800℃预烧结并保温1～3min，预烧结压力1～10MPa；然后再降温至1500～1600℃烧结并保温5～20min，烧结压力30～50MPa，制得氮化硅陶瓷。本发明采用高温预烧结和低温烧结的两步放电等离子烧结工艺，实现高性能氮化硅陶瓷的制备。该氮化硅陶瓷具有高韧性和高硬度，可应用在切削刀具领域。
Silicon nitride ceramic with high toughness and high hardness as well as preparation method and application thereof
The invention belongs to the technical field of non-oxide-based materials, and discloses high-toughness and high-hardness silicon nitride ceramic as well as a preparation method and application thereof. The method comprises the following steps: introducing a sintering aid MgO-Re2O3 into alpha-Si3N4 powder, mixing, drying to obtain mixed powder of alpha-Si3N4-MgO-Re2O3, putting the mixed powder into a discharge plasma sintering furnace mold, heating to 1700-1800 DEG C under a nitrogen atmosphere of 1 atm, pre-sintering, and keeping the temperature for 1-3 minutes at the pre-sintering pressure of 1-10 MPa; and cooling to 1500-1600 DEG C, sintering under the sintering pressure of 30-50 MPa, and keeping the temperature for 5-20 minutes to obtain the silicon nitride ceramic. According to the invention, a two-step spark plasma sintering process of high-temperature pre-sintering and low-temperature sintering is adopted, so that preparation of the high-performance silicon nitride ceramic is realized. The silicon nitride ceramic has high toughness and high hardness, and can be applied to the field of cutting tools.
本发明属于非氧化物基材料技术领域，公开了一种具有高韧性和高硬度的氮化硅陶瓷及其制备方法和应用。该方法通过向α‑Si3N4粉中引入烧结助剂MgO‑Re2O3经混料，干燥后得到α‑Si3N4‑MgO‑Re2O3的混合粉体，将混合粉体放入放电等离子烧结炉模具后，在1atm的氮气气氛下，先升温至1700～1800℃预烧结并保温1～3min，预烧结压力1～10MPa；然后再降温至1500～1600℃烧结并保温5～20min，烧结压力30～50MPa，制得氮化硅陶瓷。本发明采用高温预烧结和低温烧结的两步放电等离子烧结工艺，实现高性能氮化硅陶瓷的制备。该氮化硅陶瓷具有高韧性和高硬度，可应用在切削刀具领域。
Silicon nitride ceramic with high toughness and high hardness as well as preparation method and application thereof
一种具有高韧性和高硬度的氮化硅陶瓷及其制备方法和应用
YU JUNJIE (author) / LI ZEHUA (author) / YANG XIAOQING (author) / LIU JIAN (author) / ZENG HAIYANG (author) / WU MIN (author) / GUO WEIMING (author) / LIN HUATAI (author)
2024-10-29
Patent
Electronic Resource
Chinese
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