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Silicon nitride cast film laminated material as well as lamination process and application thereof
The invention discloses a silicon nitride cast film laminated material as well as a lamination process and application thereof, and relates to the technical field of ceramic substrates. The silicon nitride cast film lamination process comprises the following steps: preparing a silicon nitride cast film; superposing the silicon nitride cast film layer by layer to a preset thickness, performing vacuum packaging, and performing cold isostatic pressing; and removing the vacuum package of the material, carrying out secondary vacuum package, and carrying out temperature isostatic pressing to obtain the silicon nitride cast film laminated material. In the lamination process of the silicon nitride cast film, after the cast film is laminated, vacuum packaging and cold isostatic pressing are carried out, so that the interlayer adhesive force is improved; and then vacuum packaging is removed, secondary vacuum packaging is performed, and warm isostatic pressing treatment is performed, so that gas in the laminated structure can be further discharged, residual pores can be filled, the density of the material is improved, the uniformity is improved, and the interlayer binding force is enhanced.
本发明公开了一种氮化硅流延膜叠层材料及其叠层工艺和应用，涉及陶瓷基板技术领域。氮化硅流延膜叠层工艺，包括以下步骤：制备氮化硅流延膜；将所述氮化硅流延膜逐层叠加至预设厚度，真空封装，冷等静压；将物料的真空封装拆除，二次真空封装，温等静压，得到氮化硅流延膜叠层材料。氮化硅流延膜叠层工艺中，在流延膜流延膜叠层后，真空封装并冷等静压，提高层间黏合力；然后拆除真空封装、二次真空封装并温等静压处理，能够进一步排出叠层结构中的气体，填充残留孔隙，提高材料的致密度，改善均匀性，增强层间结合力。
Silicon nitride cast film laminated material as well as lamination process and application thereof
The invention discloses a silicon nitride cast film laminated material as well as a lamination process and application thereof, and relates to the technical field of ceramic substrates. The silicon nitride cast film lamination process comprises the following steps: preparing a silicon nitride cast film; superposing the silicon nitride cast film layer by layer to a preset thickness, performing vacuum packaging, and performing cold isostatic pressing; and removing the vacuum package of the material, carrying out secondary vacuum package, and carrying out temperature isostatic pressing to obtain the silicon nitride cast film laminated material. In the lamination process of the silicon nitride cast film, after the cast film is laminated, vacuum packaging and cold isostatic pressing are carried out, so that the interlayer adhesive force is improved; and then vacuum packaging is removed, secondary vacuum packaging is performed, and warm isostatic pressing treatment is performed, so that gas in the laminated structure can be further discharged, residual pores can be filled, the density of the material is improved, the uniformity is improved, and the interlayer binding force is enhanced.
本发明公开了一种氮化硅流延膜叠层材料及其叠层工艺和应用，涉及陶瓷基板技术领域。氮化硅流延膜叠层工艺，包括以下步骤：制备氮化硅流延膜；将所述氮化硅流延膜逐层叠加至预设厚度，真空封装，冷等静压；将物料的真空封装拆除，二次真空封装，温等静压，得到氮化硅流延膜叠层材料。氮化硅流延膜叠层工艺中，在流延膜流延膜叠层后，真空封装并冷等静压，提高层间黏合力；然后拆除真空封装、二次真空封装并温等静压处理，能够进一步排出叠层结构中的气体，填充残留孔隙，提高材料的致密度，改善均匀性，增强层间结合力。
Silicon nitride cast film laminated material as well as lamination process and application thereof
一种氮化硅流延膜叠层材料及其叠层工艺和应用
YU MINGXIAN (author) / YAO ZEMING (author) / DAI GAOHUAN (author) / LI YI (author)
2024-12-17
Patent
Electronic Resource
Chinese
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