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TZO target sintering forming process
The invention relates to the field of ceramic products, in particular to a TZO target sintering forming process. The preparation method comprises the following steps: 1) powder mixing: weighing zinc oxide powder and tin oxide powder, uniformly mixing, spraying a forming agent, and uniformly mixing to obtain a mixture A; 2) molding a blank: performing static pressure molding on the mixture A to obtain a molded blank; 3) shaping: carrying out hot pressing on the molded blank at 105-120 DEG C to obtain a shaped blank; 4) presintering: presintering, hot-pressing and demolding the shaped blank at the temperature of 280-305 DEG C to obtain a presintered blank; 5) sintering: sintering the pre-sintered blank at the temperature of 1170-1200 DEG C to obtain a sintered blank; 6) calcining: sintering the sintered blank at the temperature of 1700-1800 DEG C, and cooling to obtain a calcined blank; and (7) heat treatment is conducted, specifically, after heat treatment is conducted on the calcined blank, grinding, binding and polishing are conducted, and the TZO target is obtained. The obtained TZO target is high in density, and the formed target is stable in structure.
本申请涉及陶瓷制品的领域，更具体地说，它涉及一种TZO靶烧结成型工艺。1)混粉：称取氧化锌粉和氧化锡粉混合均匀，再喷洒成型剂，使其混合均匀，得混合物A；2)塑胚：将混合物A进行静压塑型，得到塑型胚；3)定型：将塑型胚在105‑120℃下，热压，得到定型胚；4)预烧：将定型胚在温度280‑305℃下，进行预烧结，热压，脱模，得到预烧胚；5)烧结：将预烧胚在温度1170‑1200℃下，进行烧结，得到烧结胚；6)煅烧：将烧结胚在温度1700‑1800℃下，进行烧结，冷却，得到煅烧胚；7)热处理：将煅烧胚进行热处理后，打磨，绑定，抛光，得到TZO靶。使得到的TZO靶具体较高的密度，并且形成的靶结构稳定。
TZO target sintering forming process
The invention relates to the field of ceramic products, in particular to a TZO target sintering forming process. The preparation method comprises the following steps: 1) powder mixing: weighing zinc oxide powder and tin oxide powder, uniformly mixing, spraying a forming agent, and uniformly mixing to obtain a mixture A; 2) molding a blank: performing static pressure molding on the mixture A to obtain a molded blank; 3) shaping: carrying out hot pressing on the molded blank at 105-120 DEG C to obtain a shaped blank; 4) presintering: presintering, hot-pressing and demolding the shaped blank at the temperature of 280-305 DEG C to obtain a presintered blank; 5) sintering: sintering the pre-sintered blank at the temperature of 1170-1200 DEG C to obtain a sintered blank; 6) calcining: sintering the sintered blank at the temperature of 1700-1800 DEG C, and cooling to obtain a calcined blank; and (7) heat treatment is conducted, specifically, after heat treatment is conducted on the calcined blank, grinding, binding and polishing are conducted, and the TZO target is obtained. The obtained TZO target is high in density, and the formed target is stable in structure.
本申请涉及陶瓷制品的领域，更具体地说，它涉及一种TZO靶烧结成型工艺。1)混粉：称取氧化锌粉和氧化锡粉混合均匀，再喷洒成型剂，使其混合均匀，得混合物A；2)塑胚：将混合物A进行静压塑型，得到塑型胚；3)定型：将塑型胚在105‑120℃下，热压，得到定型胚；4)预烧：将定型胚在温度280‑305℃下，进行预烧结，热压，脱模，得到预烧胚；5)烧结：将预烧胚在温度1170‑1200℃下，进行烧结，得到烧结胚；6)煅烧：将烧结胚在温度1700‑1800℃下，进行烧结，冷却，得到煅烧胚；7)热处理：将煅烧胚进行热处理后，打磨，绑定，抛光，得到TZO靶。使得到的TZO靶具体较高的密度，并且形成的靶结构稳定。
TZO target sintering forming process
一种TZO靶烧结成型工艺
LIU CUNLING (author) / XIONG CUIPING (author) / CHU YANHONG (author)
2024-12-27
Patent
Electronic Resource
Chinese
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