A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
IGZO SPUTTERING TARGET
An IGZO sputtering target with high relative density while suppressing increase in arcing and particle during sputtering is provided. An IGZO sputtering target includes indium (In), gallium (Ga), zinc (Zn), zirconium (Zr), and oxygen (O), the rest consisting of inevitable impurities, wherein the IGZO sputtering target includes Zr at less than 20 mass ppm and has a relative density is 95% or more.
IGZO SPUTTERING TARGET
An IGZO sputtering target with high relative density while suppressing increase in arcing and particle during sputtering is provided. An IGZO sputtering target includes indium (In), gallium (Ga), zinc (Zn), zirconium (Zr), and oxygen (O), the rest consisting of inevitable impurities, wherein the IGZO sputtering target includes Zr at less than 20 mass ppm and has a relative density is 95% or more.
IGZO SPUTTERING TARGET
IGZO-SPUTTERTARGET
CIBLE DE PULVÉRISATION IGZO
MURAI KAZUTAKA (author) / OSADA KOZO (author)
2025-02-19
Patent
Electronic Resource
English