A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
OXIDE SINTERED BODY, PRODUCTION METHOD THEREOF, AND SPUTTERING TARGET
PROBLEM TO BE SOLVED: To provide an oxide sintered body used for a sputtering target not generating splash from a target surface even at a high power deposition time, having a high deposition rate, and capable of obtaining a high refractive index film.SOLUTION: An oxide sintered body has Zn, Nb, Al and O as constituent element, and each content of Zn, Nb and Al is expressed as follows: Nb/(Zn+Nb+Al)=0.076-0.289, Al/(Zn+Nb+Al)=0.006-0.031. Preferably, in the oxide sintered body, a relative density is 98% or more, a density is 5.57 g/cmor more, a bulk resistance value is 100 Ω-cm or less, and a crystal grain size of a ZnO phase is 3 μm or less.SELECTED DRAWING: None
【課題】高パワー成膜時においてもターゲット表面からのスプラッシュがなく、高成膜レートであり、高屈折率膜を得ることができるスパッタリングターゲットに用いられる酸化物焼結体の提供。【解決手段】構成元素として、Ｚｎ、Ｎｂ、Ａｌ及びＯを有し、Ｚｎ、Ｎｂ及びＡｌの含有量が、Ｎｂ／（Ｚｎ＋Ｎｂ＋Ａｌ）＝０．０７６〜０．２８９、Ａｌ／（Ｚｎ＋Ｎｂ＋Ａｌ）＝０．００６〜０．０３１である酸化物焼結体。好ましくは、相対密度が９８％以上であり、密度が５．５７ｇ／ｃｍ３以上であり、バルク抵抗値が１００Ω・ｃｍ以下でＺｎＯ相の結晶粒径が３μｍ以下である、酸化物焼結体。【選択図】なし
OXIDE SINTERED BODY, PRODUCTION METHOD THEREOF, AND SPUTTERING TARGET
PROBLEM TO BE SOLVED: To provide an oxide sintered body used for a sputtering target not generating splash from a target surface even at a high power deposition time, having a high deposition rate, and capable of obtaining a high refractive index film.SOLUTION: An oxide sintered body has Zn, Nb, Al and O as constituent element, and each content of Zn, Nb and Al is expressed as follows: Nb/(Zn+Nb+Al)=0.076-0.289, Al/(Zn+Nb+Al)=0.006-0.031. Preferably, in the oxide sintered body, a relative density is 98% or more, a density is 5.57 g/cmor more, a bulk resistance value is 100 Ω-cm or less, and a crystal grain size of a ZnO phase is 3 μm or less.SELECTED DRAWING: None
【課題】高パワー成膜時においてもターゲット表面からのスプラッシュがなく、高成膜レートであり、高屈折率膜を得ることができるスパッタリングターゲットに用いられる酸化物焼結体の提供。【解決手段】構成元素として、Ｚｎ、Ｎｂ、Ａｌ及びＯを有し、Ｚｎ、Ｎｂ及びＡｌの含有量が、Ｎｂ／（Ｚｎ＋Ｎｂ＋Ａｌ）＝０．０７６〜０．２８９、Ａｌ／（Ｚｎ＋Ｎｂ＋Ａｌ）＝０．００６〜０．０３１である酸化物焼結体。好ましくは、相対密度が９８％以上であり、密度が５．５７ｇ／ｃｍ３以上であり、バルク抵抗値が１００Ω・ｃｍ以下でＺｎＯ相の結晶粒径が３μｍ以下である、酸化物焼結体。【選択図】なし
OXIDE SINTERED BODY, PRODUCTION METHOD THEREOF, AND SPUTTERING TARGET
酸化物焼結体、その製造方法及びスパッタリングターゲット
ITO KENICHI (author) / HARA HIROYUKI (author) / HARA SHINICHI (author)
2017-07-20
Patent
Electronic Resource
Japanese
OXIDE SINTERED BODY AND SPUTTERING TARGET COMPRISING OXIDE SINTERED BODY
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