A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
PLASMA-RESISTANT COATING OF POROUS BODY BY ATOMIC LAYER DEPOSITION
PROBLEM TO BE SOLVED: To improve corrosion resistance and erosion resistance in a semiconductor-processing chamber component by plasma.SOLUTION: This invention relates to a plasma-resistant coating which is deposited onto a surface of a porous body and onto pore walls of a plurality of pores within the porous body using an atomic layer deposition (ALD) process. The plasma resistant coating has a thickness of about 5 nm to about 3 μm, and protects the pore walls from erosion. The porous body with the plasma-resistant coating remains permeable to the gas.SELECTED DRAWING: Figure 2A
【課題】半導体処理チャンバコンポーネントのプラズマによる耐腐食性、耐浸食性を改善する。【解決手段】耐プラズマ性コーティングが、原子層堆積（ＡＬＤ）プロセスを使用した、多孔質体の表面上及び多孔質体内の複数の細孔の細孔壁上の耐プラズマ性コーティングであって、耐プラズマ性コーティングは、約５ｎｍ〜約３μｍの厚さを有し、耐プラズマ性コーティングは、細孔壁を浸食から保護し、耐プラズマ性コーティングを有する多孔質体は、ガスを透過可能のままである。【選択図】図２Ａ
PLASMA-RESISTANT COATING OF POROUS BODY BY ATOMIC LAYER DEPOSITION
PROBLEM TO BE SOLVED: To improve corrosion resistance and erosion resistance in a semiconductor-processing chamber component by plasma.SOLUTION: This invention relates to a plasma-resistant coating which is deposited onto a surface of a porous body and onto pore walls of a plurality of pores within the porous body using an atomic layer deposition (ALD) process. The plasma resistant coating has a thickness of about 5 nm to about 3 μm, and protects the pore walls from erosion. The porous body with the plasma-resistant coating remains permeable to the gas.SELECTED DRAWING: Figure 2A
【課題】半導体処理チャンバコンポーネントのプラズマによる耐腐食性、耐浸食性を改善する。【解決手段】耐プラズマ性コーティングが、原子層堆積（ＡＬＤ）プロセスを使用した、多孔質体の表面上及び多孔質体内の複数の細孔の細孔壁上の耐プラズマ性コーティングであって、耐プラズマ性コーティングは、約５ｎｍ〜約３μｍの厚さを有し、耐プラズマ性コーティングは、細孔壁を浸食から保護し、耐プラズマ性コーティングを有する多孔質体は、ガスを透過可能のままである。【選択図】図２Ａ
PLASMA-RESISTANT COATING OF POROUS BODY BY ATOMIC LAYER DEPOSITION
原子層堆積による多孔質体の耐プラズマ性コーティング
VAHID FIROUZDOR (author) / SUMANTH BANDA (author) / RAJINDER DHINDSA (author) / DANIEL BYUN (author) / DANA MARIE LOVELL (author)
2018-10-18
Patent
Electronic Resource
Japanese
Protective silicon coating for nanodiamonds using atomic layer deposition
| British Library Online Contents | 2007
Ti Coating of Nanocrystalline Diamond by Atomic Layer Deposition
| British Library Online Contents | 2006
Atomic layer deposition in porous structures: 3D photonic crystals
| British Library Online Contents | 2005
EROSION RESISTANT METAL OXIDE COATINGS DEPOSITED BY ATOMIC LAYER DEPOSITION
| European Patent Office | 2023
Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
| British Library Online Contents | 2017