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To suppress the deflection of wall panels in an underground double wall structure in which upper and lower ends of the wall panels are fixed to form double walls.SOLUTION: The present invention comprises a plurality of wall panels 20 consisting of metal sandwich panels erected inside an underground outer wall 11, and a pressure receiving block 70 which is fixed to one of the facing surfaces of the outer wall 11 and the wall panel 20 and not fixed to the other, and has a non-contact surface with a gap 16 between the pressure receiving block and the other of the facing surfaces. Deflection of the wall panel 20 is suppressed by the pressure receiving block 70, and unevenness of the outer wall 11 is absorbed by the gap 16.SELECTED DRAWING: Figure 1
【課題】壁パネルの上下の端部を固定して二重壁とする地下二重壁構造において、壁パネルの撓みを抑える。【解決手段】地下外壁11の内側に立設される金属サンドイッチパネルからなる複数の壁パネル20と、外壁11と壁パネル20の互いの対向面のうちの一方に固定され、他方には固定されず該他方との間に間隙16が空けられた非接触面を有する受圧ブロック70とを備える。壁パネル20の撓みを受圧ブロック70で抑え、外壁11の不陸を間隙16で吸収する。【選択図】図1
To suppress the deflection of wall panels in an underground double wall structure in which upper and lower ends of the wall panels are fixed to form double walls.SOLUTION: The present invention comprises a plurality of wall panels 20 consisting of metal sandwich panels erected inside an underground outer wall 11, and a pressure receiving block 70 which is fixed to one of the facing surfaces of the outer wall 11 and the wall panel 20 and not fixed to the other, and has a non-contact surface with a gap 16 between the pressure receiving block and the other of the facing surfaces. Deflection of the wall panel 20 is suppressed by the pressure receiving block 70, and unevenness of the outer wall 11 is absorbed by the gap 16.SELECTED DRAWING: Figure 1
【課題】壁パネルの上下の端部を固定して二重壁とする地下二重壁構造において、壁パネルの撓みを抑える。【解決手段】地下外壁11の内側に立設される金属サンドイッチパネルからなる複数の壁パネル20と、外壁11と壁パネル20の互いの対向面のうちの一方に固定され、他方には固定されず該他方との間に間隙16が空けられた非接触面を有する受圧ブロック70とを備える。壁パネル20の撓みを受圧ブロック70で抑え、外壁11の不陸を間隙16で吸収する。【選択図】図1
UNDERGROUND DOUBLE WALL STRUCTURE
地下二重壁構造
NAGAKAMI SHUICHI (author)
2019-03-07
Patent
Electronic Resource
Japanese
IPC:
E02D
FOUNDATIONS
,
Gründungen