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REPAIR METHOD FOR UNDERGROUND DRAINAGE FACILITY
To provide a simple repair method for underground drainage facility.SOLUTION: A repair method for an underground drainage facility 100 is provided, which includes a preparation step of preparing a liquid repair composition containing a (meth) acrylate, a polymerization initiator, and a crosslinking agent, an injection step of pouring the repair composition into an interior of a catch basin body 11 from an upper opening of the catch basin body 11 and filling a damaged portion with the repair composition, a standby step of waiting until the repair composition is cured, and a removal step of removing excess cured product from the cured composition for repair.SELECTED DRAWING: Figure 2
【課題】地下排水施設の簡便な補修方法を提供する。【解決手段】(メタ)アクリル酸塩と重合開始剤と架橋剤とを含む液状の補修用組成物を用意する用意工程と;ます本体11の上方の開口からます本体11の内部に上記補修用組成物を流し入れて、破損箇所に上記補修用組成物を充填する注入工程と;上記補修用組成物が硬化するまで待機する待機工程と;硬化した上記補修用組成物のうち、余剰の硬化物を取り除く除去工程と;を包含する、地下排水施設100の補修方法が提供される。【選択図】図2
REPAIR METHOD FOR UNDERGROUND DRAINAGE FACILITY
To provide a simple repair method for underground drainage facility.SOLUTION: A repair method for an underground drainage facility 100 is provided, which includes a preparation step of preparing a liquid repair composition containing a (meth) acrylate, a polymerization initiator, and a crosslinking agent, an injection step of pouring the repair composition into an interior of a catch basin body 11 from an upper opening of the catch basin body 11 and filling a damaged portion with the repair composition, a standby step of waiting until the repair composition is cured, and a removal step of removing excess cured product from the cured composition for repair.SELECTED DRAWING: Figure 2
【課題】地下排水施設の簡便な補修方法を提供する。【解決手段】(メタ)アクリル酸塩と重合開始剤と架橋剤とを含む液状の補修用組成物を用意する用意工程と;ます本体11の上方の開口からます本体11の内部に上記補修用組成物を流し入れて、破損箇所に上記補修用組成物を充填する注入工程と;上記補修用組成物が硬化するまで待機する待機工程と;硬化した上記補修用組成物のうち、余剰の硬化物を取り除く除去工程と;を包含する、地下排水施設100の補修方法が提供される。【選択図】図2
REPAIR METHOD FOR UNDERGROUND DRAINAGE FACILITY
地下排水施設の補修方法
NAKAI YOSHITAKA (author) / IZUTSU KIYOBUMI (author)
2019-09-05
Patent
Electronic Resource
Japanese
IPC:
E02D
FOUNDATIONS
,
Gründungen
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