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ELECTROSTATIC CHUCK DEVICE AND MANUFACTURING METHOD THEREFOR
To provide an electrostatic chuck device and manufacturing method therefor, which have a loading surface of a base excellent in plasma resistance.SOLUTION: An electrostatic chuck device 10 electrostatically attracts a plate-like sample W onto one main surface 11a of an electrostatic chuck member 11 and one main surface 11a of the electrostatic chuck member 11 is constituted of insulative particles and conductive particles. In one main surface 11a of the electrostatic chuck member 11, the size of a region different in composition from any other region is less than 5 μm in Heywood diameter distribution of volume reference.SELECTED DRAWING: Figure 1
【課題】基台の載置面において耐プラズマ性に優れる静電チャック装置およびその製造方法を提供する。【解決手段】本発明の静電チャック装置１０は、静電チャック部材１１の一主面１１ａに板状試料Ｗを静電吸着し、静電チャック部材１１の一主面１１ａは、絶縁性粒子と導電性粒子から構成され、静電チャック部材１１の一主面１１ａにおいて、他の領域とは組成が異なる領域の大きさが体積基準のＨｅｙｗｏｏｄ径分布で５μｍ未満である。【選択図】図１
ELECTROSTATIC CHUCK DEVICE AND MANUFACTURING METHOD THEREFOR
To provide an electrostatic chuck device and manufacturing method therefor, which have a loading surface of a base excellent in plasma resistance.SOLUTION: An electrostatic chuck device 10 electrostatically attracts a plate-like sample W onto one main surface 11a of an electrostatic chuck member 11 and one main surface 11a of the electrostatic chuck member 11 is constituted of insulative particles and conductive particles. In one main surface 11a of the electrostatic chuck member 11, the size of a region different in composition from any other region is less than 5 μm in Heywood diameter distribution of volume reference.SELECTED DRAWING: Figure 1
【課題】基台の載置面において耐プラズマ性に優れる静電チャック装置およびその製造方法を提供する。【解決手段】本発明の静電チャック装置１０は、静電チャック部材１１の一主面１１ａに板状試料Ｗを静電吸着し、静電チャック部材１１の一主面１１ａは、絶縁性粒子と導電性粒子から構成され、静電チャック部材１１の一主面１１ａにおいて、他の領域とは組成が異なる領域の大きさが体積基準のＨｅｙｗｏｏｄ径分布で５μｍ未満である。【選択図】図１
ELECTROSTATIC CHUCK DEVICE AND MANUFACTURING METHOD THEREFOR
静電チャック装置およびその製造方法
OTOMO MEGUMI (author) / HIDAKA NOBUHIRO (author)
2020-09-17
Patent
Electronic Resource
Japanese