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STERILIZATION SYSTEM
To provide a sterilization system which removes dirt of an inner wall in the vicinity of a seal water level of a seal water formation part by ultrasonic waves, then can supply sterilization water or sterilization gas to the inner wall after cleaning, and can suppress propagation of bacteria and molds in the inner wall.SOLUTION: A sterilization system 20 includes a seal water formation part 14, a water level elevation part 26 formed so that the water level in the seal water formation part is easily increased to a second water level W2 higher than a first water level from the first water level by water flowing in the seal water formation part, an ultrasonic oscillator 64, a sterilization device 22 for supplying sterilization water or sterilization gas to an inner wall 14e of a water level height in the seal water formation part, and a control part 29. The control part 29 emits irradiation of ultrasonic waves by an ultrasonic irradiator in at least a partial period in the state where the water level is increased to be higher than the first water level and stops supply of the sterilization water or the sterilization gas by the sterilization device 22 after at least the end of the increase in the water level toward the second water level.SELECTED DRAWING: Figure 11
【課題】封水形成部の封水水位付近の内壁の汚れを超音波により落とした後で、除菌水又は除菌ガスを、洗浄後の内壁に供給でき、内壁における菌やカビの増殖を抑制できる除菌システムを提供する。【解決手段】本発明の除菌システム20は、封水形成部14と、封水形成部内に流入する水により、封水形成部内の水位が第1水位から第1水位より高い第2水位W2まで上昇されやすくなるように形成されている水位上昇部26と、超音波発振器64と、除菌水又は除菌ガスを封水形成部内の水位高さの内壁14eまで供給する除菌装置22と、制御部29と、を備え、制御部29は、第1水位よりも水位が上昇している状態の少なくとも一部の期間において超音波照射器による超音波の照射を行わせると共に、第2水位に向かう水位上昇が少なくとも終わってから除菌装置22による除菌水又は除菌ガスの供給を停止させる。【選択図】図11
STERILIZATION SYSTEM
To provide a sterilization system which removes dirt of an inner wall in the vicinity of a seal water level of a seal water formation part by ultrasonic waves, then can supply sterilization water or sterilization gas to the inner wall after cleaning, and can suppress propagation of bacteria and molds in the inner wall.SOLUTION: A sterilization system 20 includes a seal water formation part 14, a water level elevation part 26 formed so that the water level in the seal water formation part is easily increased to a second water level W2 higher than a first water level from the first water level by water flowing in the seal water formation part, an ultrasonic oscillator 64, a sterilization device 22 for supplying sterilization water or sterilization gas to an inner wall 14e of a water level height in the seal water formation part, and a control part 29. The control part 29 emits irradiation of ultrasonic waves by an ultrasonic irradiator in at least a partial period in the state where the water level is increased to be higher than the first water level and stops supply of the sterilization water or the sterilization gas by the sterilization device 22 after at least the end of the increase in the water level toward the second water level.SELECTED DRAWING: Figure 11
【課題】封水形成部の封水水位付近の内壁の汚れを超音波により落とした後で、除菌水又は除菌ガスを、洗浄後の内壁に供給でき、内壁における菌やカビの増殖を抑制できる除菌システムを提供する。【解決手段】本発明の除菌システム20は、封水形成部14と、封水形成部内に流入する水により、封水形成部内の水位が第1水位から第1水位より高い第2水位W2まで上昇されやすくなるように形成されている水位上昇部26と、超音波発振器64と、除菌水又は除菌ガスを封水形成部内の水位高さの内壁14eまで供給する除菌装置22と、制御部29と、を備え、制御部29は、第1水位よりも水位が上昇している状態の少なくとも一部の期間において超音波照射器による超音波の照射を行わせると共に、第2水位に向かう水位上昇が少なくとも終わってから除菌装置22による除菌水又は除菌ガスの供給を停止させる。【選択図】図11
STERILIZATION SYSTEM
除菌システム
IWABATA TOMOHIRO (author) / URATA MUNEYUKI (author) / OTOWA YUYA (author)
2023-05-24
Patent
Electronic Resource
Japanese