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Ceramic heater for semiconductor manufacturing apparatus
Disclosed is a ceramic heater for a semiconductor manufacturing apparatus, capable of having excellence in volume resistivity at a high temperature and thermal conductivity at a room temperature in comparison to a general ceramic heater for a semiconductor manufacturing apparatus. The ceramic heater for a semiconductor manufacturing apparatus includes: a ceramic substrate including an aluminum nitride (AlN) (a), at least one (b) among a magnesium oxide (MgO), alumina (Al_2_O_3) and spinel (MgAl_2_O_4), a calcium oxide (CaO) (c), and a titanium dioxide (TiO_2) (d); and a resistive heating element.
통상의 반도체 제조 장치용 세라믹 히터에 비해 특히 고온에서의 체적 저항과 상온에서의 열 전도도가 우수한 반도체 제조 장치용 세라믹 히터가 개시된다. 상기 반도체 제조 장치용 세라믹 히터는, a) 질화알루미늄(AlN), b) 산화마그네슘(MgO), 알루미나(Al2O3) 및 스피넬(MgAl2O4) 중 어느 하나 이상, c) 산화칼슘(CaO) 및 d) 이산화타이타늄(TiO2)을 포함하는 세라믹 기판; 및 저항 발열체;를 포함한다.
Ceramic heater for semiconductor manufacturing apparatus
Disclosed is a ceramic heater for a semiconductor manufacturing apparatus, capable of having excellence in volume resistivity at a high temperature and thermal conductivity at a room temperature in comparison to a general ceramic heater for a semiconductor manufacturing apparatus. The ceramic heater for a semiconductor manufacturing apparatus includes: a ceramic substrate including an aluminum nitride (AlN) (a), at least one (b) among a magnesium oxide (MgO), alumina (Al_2_O_3) and spinel (MgAl_2_O_4), a calcium oxide (CaO) (c), and a titanium dioxide (TiO_2) (d); and a resistive heating element.
통상의 반도체 제조 장치용 세라믹 히터에 비해 특히 고온에서의 체적 저항과 상온에서의 열 전도도가 우수한 반도체 제조 장치용 세라믹 히터가 개시된다. 상기 반도체 제조 장치용 세라믹 히터는, a) 질화알루미늄(AlN), b) 산화마그네슘(MgO), 알루미나(Al2O3) 및 스피넬(MgAl2O4) 중 어느 하나 이상, c) 산화칼슘(CaO) 및 d) 이산화타이타늄(TiO2)을 포함하는 세라믹 기판; 및 저항 발열체;를 포함한다.
Ceramic heater for semiconductor manufacturing apparatus
반도체 제조 장치용 세라믹 히터
KIM YUN HO (author) / KIM JOO HWAN (author) / PARK HWAN YOUNG (author) / KIM BO SUNG (author)
2023-05-26
Patent
Electronic Resource
Korean
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