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OXIDE EVAPORATION MATERIAL AND HIGH-REFRACTIVE-INDEX TRANSPARENT FILM
According to the present invention, an oxide deposited material contains indium oxide as a main component; is composed of a sintered body containing cerium exceeding 0.110 and not greater than 0.538 in a Ce/In atomic ratio; and has an L* value of 62-95 in CIE 1976 color system. Since the oxide deposited material having the L* value of 62-95 has an optimum amount of oxygen, an amount of oxygen gas introduced into a deposition vacuum chamber has low resistance with a low refractive index of at least 2.15-2.51 at a wavelength of 550 nm. A transparent film of high transparency and high refractive index in visible region to near infrared region is able to be produced by a vacuum deposition method, and a difference in composition between the film and the deposited material is able to be reduced since an amount of introduced oxygen gas is small.
본 발명의 산화물 증착재는 산화인듐을 주성분으로 하고, Ce/In 원자수비로 0.110을 초과하고 0.538 이하의 세륨을 포함하는 소결체에 의해 구성되고, CIE 1976 표색계에서의 L값이 62∼95인 것을 특징으로 한다. L값이 62∼95인 상기 산화물 증착재는 최적의 산소량을 갖기 때문에, 성막 진공조로의 산소 가스 도입량이 적어도 파장 550nm에서의 굴절률이 2.15∼2.51의 저저항이고 가시역부터 근적외역에서의 고투과성의 고굴절률 투명막을 진공증착법으로 제조할 수 있고, 산소 가스의 도입량이 적기 때문에 막과 증착재와의 조성차를 작게 할 수 있다.
OXIDE EVAPORATION MATERIAL AND HIGH-REFRACTIVE-INDEX TRANSPARENT FILM
According to the present invention, an oxide deposited material contains indium oxide as a main component; is composed of a sintered body containing cerium exceeding 0.110 and not greater than 0.538 in a Ce/In atomic ratio; and has an L* value of 62-95 in CIE 1976 color system. Since the oxide deposited material having the L* value of 62-95 has an optimum amount of oxygen, an amount of oxygen gas introduced into a deposition vacuum chamber has low resistance with a low refractive index of at least 2.15-2.51 at a wavelength of 550 nm. A transparent film of high transparency and high refractive index in visible region to near infrared region is able to be produced by a vacuum deposition method, and a difference in composition between the film and the deposited material is able to be reduced since an amount of introduced oxygen gas is small.
본 발명의 산화물 증착재는 산화인듐을 주성분으로 하고, Ce/In 원자수비로 0.110을 초과하고 0.538 이하의 세륨을 포함하는 소결체에 의해 구성되고, CIE 1976 표색계에서의 L값이 62∼95인 것을 특징으로 한다. L값이 62∼95인 상기 산화물 증착재는 최적의 산소량을 갖기 때문에, 성막 진공조로의 산소 가스 도입량이 적어도 파장 550nm에서의 굴절률이 2.15∼2.51의 저저항이고 가시역부터 근적외역에서의 고투과성의 고굴절률 투명막을 진공증착법으로 제조할 수 있고, 산소 가스의 도입량이 적기 때문에 막과 증착재와의 조성차를 작게 할 수 있다.
OXIDE EVAPORATION MATERIAL AND HIGH-REFRACTIVE-INDEX TRANSPARENT FILM
산화물 증착재와 고굴절률 투명막
ABE YOSHIYUKI (author) / WAKE RIICHIRO (author) / KUWAHARA MASAKAZU (author) / MAENO YASUYUKI (author)
2017-05-15
Patent
Electronic Resource
Korean
OXIDE EVAPORATION MATERIAL AND HIGH-REFRACTIVE-INDEX TRANSPARENT FILM
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