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Sputtering target, magnetic film, and perpendicular magnetic recording medium
Provided is a sputtering target, the sputtering target containing 0.05 at % or more of Bi and having a total content of metal oxides of from 10 vol % to 60 vol %, the balance containing at least Co and Pt.
Sputtering target, magnetic film, and perpendicular magnetic recording medium
Provided is a sputtering target, the sputtering target containing 0.05 at % or more of Bi and having a total content of metal oxides of from 10 vol % to 60 vol %, the balance containing at least Co and Pt.
Sputtering target, magnetic film, and perpendicular magnetic recording medium
MASUDA MANAMI (author) / SHIMIZU MASAYOSHI (author) / IWABUCHI YASUYUKI (author)
2023-04-04
Patent
Electronic Resource
English
IPC:
H01J
Elektrische Entladungsröhren oder Entladungslampen
,
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
/
C04B
Kalk
,
LIME
/
C22C
Legierungen
,
ALLOYS
/
C23C
Beschichten metallischer Werkstoffe
,
COATING METALLIC MATERIAL
/
G11B
Informationsspeicherung mit Relativbewegung zwischen Aufzeichnungsträger und Wandler
,
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
/
H01F
MAGNETS
,
Magnete
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