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Porous ceramic, member for semiconductor manufacturing apparatus, shower plate and plug
A porous ceramic of the present disclosure contains yttrium zirconate and yttrium oxide, and at least one of them is a main component. A member for a semiconductor manufacturing apparatus such as a shower plate, a plug or the like in a semiconductor manufacturing apparatus is made of the above porous ceramic.
Porous ceramic, member for semiconductor manufacturing apparatus, shower plate and plug
A porous ceramic of the present disclosure contains yttrium zirconate and yttrium oxide, and at least one of them is a main component. A member for a semiconductor manufacturing apparatus such as a shower plate, a plug or the like in a semiconductor manufacturing apparatus is made of the above porous ceramic.
Porous ceramic, member for semiconductor manufacturing apparatus, shower plate and plug
MATSUFUJI HIROMASA (author)
2024-06-11
Patent
Electronic Resource
English
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