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SPHERICAL SILICON OXYCARBIDE PARTICLE MATERIAL AND MANUFACTURING METHOD THEREOF
Spherical silicon oxycarbide particle material and manufacturing method thereof are provided as follows. Organotrialkoxysilane is hydrolyzed in a pH 3-6 acetic acid aqueous solution, thereafter an alkaline aqueous solution such as a pH 7-12 ammonia water was added to the obtained hydrolysate. The condensation reaction is performed in an alkaline range to form spherical polysilsesquioxane particles that are spherical silicon oxycarbide precursors that has no melting point or softening point. Sintering was then performed at a sintering temperature of 600-1400° C. under inert atmosphere to obtain spherical silicon oxycarbide particle material.
SPHERICAL SILICON OXYCARBIDE PARTICLE MATERIAL AND MANUFACTURING METHOD THEREOF
Spherical silicon oxycarbide particle material and manufacturing method thereof are provided as follows. Organotrialkoxysilane is hydrolyzed in a pH 3-6 acetic acid aqueous solution, thereafter an alkaline aqueous solution such as a pH 7-12 ammonia water was added to the obtained hydrolysate. The condensation reaction is performed in an alkaline range to form spherical polysilsesquioxane particles that are spherical silicon oxycarbide precursors that has no melting point or softening point. Sintering was then performed at a sintering temperature of 600-1400° C. under inert atmosphere to obtain spherical silicon oxycarbide particle material.
SPHERICAL SILICON OXYCARBIDE PARTICLE MATERIAL AND MANUFACTURING METHOD THEREOF
KIZAKI TETSURO (author) / IWATANI KEIZO (author)
2016-12-22
Patent
Electronic Resource
English
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