A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
SINTERED BODY, SPUTTERING TARGET, OXIDE THIN FILM, THIN FILM TRANSISTOR, ELECTRONIC EQUIPMENT, AND METHOD FOR PRODUCING SINTERED BODY
A sintered body of an oxide containing an In element, a Ga element, and an Al element, wherein the atomic compositional ratio of the In element and the Al element satisfies formula (1) and formula (2). [In]/([In]+[Ga]+[Al])>0.70 … (1) [Al]/([In]+[Ga]+[Al])>0.01 … (2)
Un corps fritté fait d'un oxyde contenant un élément In, un élément, un élément Ga et un élément Al, le rapport de composition atomique de l'élément In et de l'élément Al satisfaisant la formule (1) et la formule (2). [In]/([In]+[Ga]+[Al])>0,70 … (1) [Al]/([In]+[Ga]+[Al])>0,01 … (2)
Ｉｎ元素、Ｇａ元素、及びＡｌ元素を含む酸化物の焼結体であって、前記Ｉｎ元素、及び前記Ａｌ元素の原子組成比が下記式（１）及び下記式（２）を満たす、焼結体。 ［Ｉｎ］／（［Ｉｎ］＋［Ｇａ］＋［Ａｌ］）＞０．７０ ・・・・（１） ［Ａｌ］／（［Ｉｎ］＋［Ｇａ］＋［Ａｌ］）＞０．０１ ・・・・（２）
SINTERED BODY, SPUTTERING TARGET, OXIDE THIN FILM, THIN FILM TRANSISTOR, ELECTRONIC EQUIPMENT, AND METHOD FOR PRODUCING SINTERED BODY
A sintered body of an oxide containing an In element, a Ga element, and an Al element, wherein the atomic compositional ratio of the In element and the Al element satisfies formula (1) and formula (2). [In]/([In]+[Ga]+[Al])>0.70 … (1) [Al]/([In]+[Ga]+[Al])>0.01 … (2)
Un corps fritté fait d'un oxyde contenant un élément In, un élément, un élément Ga et un élément Al, le rapport de composition atomique de l'élément In et de l'élément Al satisfaisant la formule (1) et la formule (2). [In]/([In]+[Ga]+[Al])>0,70 … (1) [Al]/([In]+[Ga]+[Al])>0,01 … (2)
Ｉｎ元素、Ｇａ元素、及びＡｌ元素を含む酸化物の焼結体であって、前記Ｉｎ元素、及び前記Ａｌ元素の原子組成比が下記式（１）及び下記式（２）を満たす、焼結体。 ［Ｉｎ］／（［Ｉｎ］＋［Ｇａ］＋［Ａｌ］）＞０．７０ ・・・・（１） ［Ａｌ］／（［Ｉｎ］＋［Ｇａ］＋［Ａｌ］）＞０．０１ ・・・・（２）
SINTERED BODY, SPUTTERING TARGET, OXIDE THIN FILM, THIN FILM TRANSISTOR, ELECTRONIC EQUIPMENT, AND METHOD FOR PRODUCING SINTERED BODY
CORPS FRITTÉ, CIBLE DE PULVÉRISATION, COUCHE MINCE D'OXYDE, TRANSISTOR À COUCHES MINCES, ÉQUIPEMENT ÉLECTRONIQUE ET PROCÉDÉ DE PRODUCTION DE CORPS FRITTÉ
焼結体、スパッタリングターゲット、酸化物薄膜、薄膜トランジスタ、電子機器、及び焼結体の製造方法
KAWASHIMA EMI (author) / ITOSE MAMI (author) / KAIJO AKIRA (author) / INOUE KAZUYOSHI (author) / IWASE NOBUHIRO (author)
2023-09-21
Patent
Electronic Resource
Japanese
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