A platform for research: civil engineering, architecture and urbanism
A platform for research: civil engineering, architecture and urbanism
MOLYBDENUM OXIDE SINTERED BODY, SPUTTERING TARGET, AND OXIDE THIN FILM
The present invention provides: an oxide sintered body comprising a molybdenum oxide as the main component; a sputtering target comprising the sintered body; and an oxide thin film formed therefrom. According to the present invention, by adding a specific metal oxide in an amount in a predetermined range to sinter-resistant molybdenum oxide and niobium oxide, it is possible to simultaneously achieve improved sinterability, high-density characteristics, and thin film uniformity, which is achieved through particle growth control, even when performing non-pressurized sintering.
La présente invention concerne : un corps fritté d'oxyde comprenant un oxyde de molybdène en tant que constituant principal ; une cible de pulvérisation comprenant le corps fritté ; et un film mince d'oxyde formé à partir de celui-ci. Selon la présente invention, en ajoutant un oxyde métallique spécifique en une proportion dans une plage prédéterminée à de l'oxyde de molybdène résistant au frittage et à de l'oxyde de niobium, il est possible d'obtenir simultanément une aptitude au frittage améliorée, des caractéristiques de haute densité et une uniformité de film mince, qui est obtenue par la régulation de croissance de particules, même lors de la réalisation d'un frittage non pressurisé.
본 발명은 몰리브덴 산화물을 주(主)성분으로 하는 산화물 소결체, 상기 소결체를 포함하는 스퍼터링 타겟 및 이로부터 형성된 산화물 박막을 제공한다. 본 발명에서는 난(難)소결성 몰리브덴 산화물과 니오븀 산화물에 특정 금속산화물을 소정 함량 범위로 첨가함으로써, 무가압 소결을 실시하더라도 소결성 개선, 고밀도 특성, 및 입자 성장 제어를 통한 박막의 균일성을 동시에 확보할 수 있다.
MOLYBDENUM OXIDE SINTERED BODY, SPUTTERING TARGET, AND OXIDE THIN FILM
The present invention provides: an oxide sintered body comprising a molybdenum oxide as the main component; a sputtering target comprising the sintered body; and an oxide thin film formed therefrom. According to the present invention, by adding a specific metal oxide in an amount in a predetermined range to sinter-resistant molybdenum oxide and niobium oxide, it is possible to simultaneously achieve improved sinterability, high-density characteristics, and thin film uniformity, which is achieved through particle growth control, even when performing non-pressurized sintering.
La présente invention concerne : un corps fritté d'oxyde comprenant un oxyde de molybdène en tant que constituant principal ; une cible de pulvérisation comprenant le corps fritté ; et un film mince d'oxyde formé à partir de celui-ci. Selon la présente invention, en ajoutant un oxyde métallique spécifique en une proportion dans une plage prédéterminée à de l'oxyde de molybdène résistant au frittage et à de l'oxyde de niobium, il est possible d'obtenir simultanément une aptitude au frittage améliorée, des caractéristiques de haute densité et une uniformité de film mince, qui est obtenue par la régulation de croissance de particules, même lors de la réalisation d'un frittage non pressurisé.
본 발명은 몰리브덴 산화물을 주(主)성분으로 하는 산화물 소결체, 상기 소결체를 포함하는 스퍼터링 타겟 및 이로부터 형성된 산화물 박막을 제공한다. 본 발명에서는 난(難)소결성 몰리브덴 산화물과 니오븀 산화물에 특정 금속산화물을 소정 함량 범위로 첨가함으로써, 무가압 소결을 실시하더라도 소결성 개선, 고밀도 특성, 및 입자 성장 제어를 통한 박막의 균일성을 동시에 확보할 수 있다.
MOLYBDENUM OXIDE SINTERED BODY, SPUTTERING TARGET, AND OXIDE THIN FILM
CORPS FRITTÉ D'OXYDE DE MOLYBDÈNE, CIBLE DE PULVÉRISATION CATHODIQUE ET FILM MINCE D'OXYDE
몰리브덴 산화물 소결체, 스퍼터링 타겟 및 산화물 박막
HWANG BYUNGJIN (author) / PARK JAESOUNG (author) / LEE HYOWON (author) / LEE SEUNGYI (author) / PARK SANGYONG (author) / JANG BONGJUNG (author) / YUN EUNSUB (author) / JIN SEUNGHYEON (author) / YANG SEUNGHO (author)
2024-10-17
Patent
Electronic Resource
Korean
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