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MOLYBDENUM OXIDE SINTERED BODY SPUTTERING TARGET AND OXIDE THIN FILM
본 발명은 몰리브덴계 산화물 소결체, 상기 소결체를 포함하는 스퍼터링 타겟 및 이로부터 형성된 산화물 박막을 제공한다. 본 발명에서는 난(難)소결성 몰리브덴 산화물과 니오븀 산화물에 특정 도펀트를 소정 함량 범위로 첨가함으로써, 무가압 소결을 실시하더라도 소결성 개선, 고밀도 특성, 입자 성장 제어를 통한 박막의 균일성, 저반사 및 저저항 특성을 동시에 확보할 수 있다.
The present invention provides a sintered body of molybdenum-based oxide, a sputerring target comprising the sintered body, and an oxide thin film formed from same. In the present invention, a particular dopant is added to sinter-resistant molybdenum oxide and niobium oxide within a certain amount range, and thus, even with pressureless sintering, improved sinterability, high-density characteristics, thin film uniformity through particle growth control, and low-reflection and low-resistance characteristics can be ensured at the same time.
MOLYBDENUM OXIDE SINTERED BODY SPUTTERING TARGET AND OXIDE THIN FILM
본 발명은 몰리브덴계 산화물 소결체, 상기 소결체를 포함하는 스퍼터링 타겟 및 이로부터 형성된 산화물 박막을 제공한다. 본 발명에서는 난(難)소결성 몰리브덴 산화물과 니오븀 산화물에 특정 도펀트를 소정 함량 범위로 첨가함으로써, 무가압 소결을 실시하더라도 소결성 개선, 고밀도 특성, 입자 성장 제어를 통한 박막의 균일성, 저반사 및 저저항 특성을 동시에 확보할 수 있다.
The present invention provides a sintered body of molybdenum-based oxide, a sputerring target comprising the sintered body, and an oxide thin film formed from same. In the present invention, a particular dopant is added to sinter-resistant molybdenum oxide and niobium oxide within a certain amount range, and thus, even with pressureless sintering, improved sinterability, high-density characteristics, thin film uniformity through particle growth control, and low-reflection and low-resistance characteristics can be ensured at the same time.
MOLYBDENUM OXIDE SINTERED BODY SPUTTERING TARGET AND OXIDE THIN FILM
몰리브덴 산화물 소결체, 스퍼터링 타겟 및 산화물 박막
JANG BONGJUNG (author) / PARK JAESOUNG (author) / LEE HYOWON (author) / LEE SEUNGYI (author) / HWANG BYUNGJIN (author) / PARK SANGYONG (author) / YUN EUNSUB (author) / JIN SEUNGHYEON (author) / YANG SEUNGHO (author)
2024-10-22
Patent
Electronic Resource
Korean
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