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Plasma-Assisted Deposition of Polymers
Abstract It has been known for many decades that the introduction of an organic monomer into a glow discharge, independently of the presence of an inert gas carrier, produce various fragments which rearrange through many gas-phase and surface processes leading to the formation of a variety of addition compounds and of polymer films on the inner surfaces of the reactor. If such films are obtained under controlled conditions, that is at the desired substrate temperature, gas pressure and electrical discharge parameters, they have unique characteristics allowing their classification as an entirely new class of materials with only small or negligible correlations with their counterparts obtained by conventional techniques.
Plasma-Assisted Deposition of Polymers
Abstract It has been known for many decades that the introduction of an organic monomer into a glow discharge, independently of the presence of an inert gas carrier, produce various fragments which rearrange through many gas-phase and surface processes leading to the formation of a variety of addition compounds and of polymer films on the inner surfaces of the reactor. If such films are obtained under controlled conditions, that is at the desired substrate temperature, gas pressure and electrical discharge parameters, they have unique characteristics allowing their classification as an entirely new class of materials with only small or negligible correlations with their counterparts obtained by conventional techniques.
Plasma-Assisted Deposition of Polymers
d’Agostino, R. (author)
1990-01-01
32 pages
Article/Chapter (Book)
Electronic Resource
English
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