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High‐Throughput Contact Flow Lithography

Le Goff, Gaelle C. / Lee, Jiseok / Gupta, Ankur / Hill, William Adam / Doyle, Patrick S.

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High‐Throughput Contact Flow Lithography

Le Goff, Gaelle C. / Lee, Jiseok / Gupta, Ankur / Hill, William Adam / Doyle, Patrick S.

High‐Throughput Contact Flow Lithography

Le Goff, Gaelle C. / Lee, Jiseok / Gupta, Ankur / Hill, William Adam / Doyle, Patrick S.

Access

Download

Page navigation

Document information

Similar titles

Export, share and cite

Document information

Title:

High‐Throughput Contact Flow Lithography

Contributors:

Le Goff, Gaelle C. (author) / Lee, Jiseok (author) / Gupta, Ankur (author) / Hill, William Adam (author) / Doyle, Patrick S. (author)

Published in:

Advanced Science ; 2

Publication date:

2015-10-01

Size:

7 pages

ISSN:

2198-3844

DOI:

https://doi.org/10.1002/advs.201500149

Type of media:

Article (Journal)

Type of material:

Electronic Resource

Language:

English

Keywords:

microfluidics , encoded particles , contact flow lithography , high‐throughput , hydrogel

Hill, William Adam / Le Goff, Gaelle / Lee, Ji Seok et al. | DSpace@MIT | 2015

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