Overview of Modern Lithography Techniques and a MEMS-Bases Approach to High Throughput Rate Electron Beam Lithography: Fid-Bau Portal

Overview of Modern Lithography Techniques and a MEMS-Bases Approach to High Throughput Rate Electron Beam Lithography

Chase, J. G. / Smith, B. W.

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Overview of Modern Lithography Techniques and a MEMS-Bases Approach to High Throughput Rate Electron Beam Lithography

Chase, J. G. / Smith, B. W.

Overview of Modern Lithography Techniques and a MEMS-Bases Approach to High Throughput Rate Electron Beam Lithography

Chase, J. G. / Smith, B. W.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Overview of Modern Lithography Techniques and a MEMS-Bases Approach to High Throughput Rate Electron Beam Lithography

Contributors:

Chase, J. G. (author) / Smith, B. W. (author)

Published in:

JOURNAL OF INTELLIGENT MATERIAL SYSTEMS AND STRUCTURES ; 12 ; 807-818

Publication date:

2001-01-01

Size:

12 pages

ISSN:

1045-389X

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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