Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015): Fid-Bau Portal

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Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)

Jeong, Hyeon‐Ho / Mark, Andrew G. / Lee, Tung‐Chun / Son, Kwanghyo / Chen, Wenwen / Alarcón‐Correa, Mariana / Kim, Insook / Schütz, Gisela / Fischer, Peer

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Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)

Jeong, Hyeon‐Ho / Mark, Andrew G. / Lee, Tung‐Chun / Son, Kwanghyo / Chen, Wenwen / Alarcón‐Correa, Mariana / Kim, Insook / Schütz, Gisela / Fischer, Peer

Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)

Jeong, Hyeon‐Ho / Mark, Andrew G. / Lee, Tung‐Chun / Son, Kwanghyo / Chen, Wenwen / Alarcón‐Correa, Mariana / Kim, Insook / Schütz, Gisela / Fischer, Peer

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Title:

Nanolithography: Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch‐Mask Applications (Adv. Sci. 7/2015)

Contributors:

Jeong, Hyeon‐Ho (author) / Mark, Andrew G. (author) / Lee, Tung‐Chun (author) / Son, Kwanghyo (author) / Chen, Wenwen (author) / Alarcón‐Correa, Mariana (author) / Kim, Insook (author) / Schütz, Gisela (author) / Fischer, Peer (author)

Published in:

Advanced Science ; 2

Publication date:

2015-07-01

Size:

1 pages

ISSN:

DOI:

https://doi.org/10.1002/advs.201570022

Type of media:

Article (Journal)

Type of material:

Electronic Resource

Language:

English

Keywords:

glancing angle deposition , nanoparticle lithography , nanoimprint lithography , shadow growth physical vapor deposition , block copolymer micelle nanolithography

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