New excimer ultraviolet sources for photo-assisted deposition of thin films: an alternative to excimer-laser-induced deposition (Invited Paper) [2403-23]: Fid-Bau Portal

New excimer ultraviolet sources for photo-assisted deposition of thin films: an alternative to excimer-laser-induced deposition (Invited Paper) [2403-23]

Boyd, I. W. / Zhang, J.-Y. / Bergonzo, P. / SPIE

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New excimer ultraviolet sources for photo-assisted deposition of thin films: an alternative to excimer-laser-induced deposition (Invited Paper) [2403-23]

Boyd, I. W. / Zhang, J.-Y. / Bergonzo, P. / SPIE

New excimer ultraviolet sources for photo-assisted deposition of thin films: an alternative to excimer-laser-induced deposition (Invited Paper) [2403-23]

Boyd, I. W. / Zhang, J.-Y. / Bergonzo, P. / SPIE

Zugriff

Zugriff über TIB

Verfügbarkeit in meiner Bibliothek prüfen

Bestellung bei Subito €

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Ähnliche Titel

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Dokumentinformationen

Titel:

New excimer ultraviolet sources for photo-assisted deposition of thin films: an alternative to excimer-laser-induced deposition (Invited Paper) [2403-23]

Beteiligte:

Boyd, I. W. (Autor:in) / Zhang, J.-Y. (Autor:in) / Bergonzo, P. (Autor:in) / Dobowski, J. J. / SPIE

Kongress:

Conference, Laser-induced thin film processing ; 1995 ; San Jose; CA

Erschienen in:

Laser-induced thin film processing ; 290-301

PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING

Erscheinungsdatum:

01.01.1995

Format / Umfang:

12 pages

ISBN:

0819417505

ISSN:

0361-0748

Medientyp:

Aufsatz (Konferenz)

Format:

Sprache:

Englisch

Schlagwörter:

laser induced thin film processing , SPIE

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