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Utilization of surface electromagnetic wave excitation for increase of submicron diffraction grating depth on n-InP fabricated by holographic wet etching [2403-45]
Utilization of surface electromagnetic wave excitation for increase of submicron diffraction grating depth on n-InP fabricated by holographic wet etching [2403-45]
Utilization of surface electromagnetic wave excitation for increase of submicron diffraction grating depth on n-InP fabricated by holographic wet etching [2403-45]
Panchenko, V. Y. (Autor:in) / Seminogov, V. N. (Autor:in) / Khudobenko, A. I. (Autor:in) / Dobowski, J. J. / SPIE
Conference, Laser-induced thin film processing ; 1995 ; San Jose; CA
01.01.1995
15 pages
Aufsatz (Konferenz)
Englisch
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