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Fabrication of submicron relief gratings in p-GaAs in the process of maskless holographic wet etching by laser-induced etch rate reduction method [2403-29]
Fabrication of submicron relief gratings in p-GaAs in the process of maskless holographic wet etching by laser-induced etch rate reduction method [2403-29]
Fabrication of submicron relief gratings in p-GaAs in the process of maskless holographic wet etching by laser-induced etch rate reduction method [2403-29]
Khudobenko, A. I. (Autor:in) / Panchenko, V. Y. (Autor:in) / Seminogov, V. N. (Autor:in) / Dobowski, J. J. / SPIE
Conference, Laser-induced thin film processing ; 1995 ; San Jose; CA
01.01.1995
5 pages
Aufsatz (Konferenz)
Englisch
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