Utilization of surface electromagnetic wave excitation for increase of submicron diffraction grating depth on n-InP fabricated by holographic wet etching [2403-45]: Fid-Bau Portal

Utilization of surface electromagnetic wave excitation for increase of submicron diffraction grating depth on n-InP fabricated by holographic wet etching [2403-45]

Panchenko, V. Y. / Seminogov, V. N. / Khudobenko, A. I. / SPIE

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Utilization of surface electromagnetic wave excitation for increase of submicron diffraction grating depth on n-InP fabricated by holographic wet etching [2403-45]

Panchenko, V. Y. / Seminogov, V. N. / Khudobenko, A. I. / SPIE

Utilization of surface electromagnetic wave excitation for increase of submicron diffraction grating depth on n-InP fabricated by holographic wet etching [2403-45]

Panchenko, V. Y. / Seminogov, V. N. / Khudobenko, A. I. / SPIE

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Check availability in my library

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Document information

Title:

Utilization of surface electromagnetic wave excitation for increase of submicron diffraction grating depth on n-InP fabricated by holographic wet etching [2403-45]

Contributors:

Panchenko, V. Y. (author) / Seminogov, V. N. (author) / Khudobenko, A. I. (author) / Dobowski, J. J. / SPIE

Conference:

Conference, Laser-induced thin film processing ; 1995 ; San Jose; CA

Published in:

Laser-induced thin film processing ; 394-408

PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING

Publication date:

1995-01-01

Size:

15 pages

ISBN:

0819417505

ISSN:

0361-0748

Type of media:

Conference paper

Type of material:

Language:

English

Keywords:

laser induced thin film processing , SPIE

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