Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
In-process control of silicide formation during rapid thermal processing
In-process control of silicide formation during rapid thermal processing
In-process control of silicide formation during rapid thermal processing
Dilhac, J.-M. (Autor:in) / Ganibal, C. (Autor:in) / Nolhier, N. (Autor:in) / Moynagh, P. B. (Autor:in)
APPLIED SURFACE SCIENCE ; 63 ; 131
01.01.1993
131 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
A parametric study of titanium silicide formation by rapid thermal processing
British Library Online Contents | 1996
|Nickel mono-silicide formation using a photo-thermal process assisted by ultra-violet laser
British Library Online Contents | 2018
|Excess vacancy generation in silicon during surface silicide formation
British Library Online Contents | 1993
|Nickel mono-silicide formation using a photo-thermal process assisted by ultra-violet laser
British Library Online Contents | 2018
|