Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Electrical resistivity of RuO~x thin films prepared by ion beam sputter deposition
Electrical resistivity of RuO~x thin films prepared by ion beam sputter deposition
Electrical resistivity of RuO~x thin films prepared by ion beam sputter deposition
Kezuka, H. ( Autor:in ) / Egerton, R. ( Autor:in ) / Masui, M. ( Autor:in ) / Wada, T. ( Autor:in )
APPLIED SURFACE SCIENCE ; 65//66 ; 293
01.01.1993
293 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 2000
|British Library Online Contents | 2000
|Amorphous molybdenum nitride thin films prepared by reactive sputter deposition
British Library Online Contents | 2004
|Low-Energy Broad-Beam Sputter Deposition of TiN~x Thin Films
British Library Online Contents | 2003
|Ion beam sputter deposition of YBa~2Cu~3O~7~-~ thin films
British Library Online Contents | 1993
|