Crystallization of amorphous thin LPCVD Si films: "in situ" TEM measurement of nucleation and grain growth rates

Guillemet, J. P. / De Mauduit, B. / Pieraggi, B. et al. | British Library Online Contents | 1993

Crystallization kinetics of hydrogenated amorphous silicon thick films grown by plasma-enhanced chemical vapour deposition

Farjas, J. / Rath, C. / Roura, P. et al. | British Library Online Contents | 2004

Silicon thin films obtained by rapid thermal atmospheric pressure chemical vapour deposition

Monna, R. / Slaoui, A. / Lachiq, A. et al. | British Library Online Contents | 1996

Atmospheric pressure chemical vapour deposition of vanadium diselenide thin films

Boscher, N. D. / Blackman, C. S. / Carmalt, C. J. et al. | British Library Online Contents | 2007

Role of Substrate on the Growth Process of Polycrystalline Silicon Thin Films by Low-Pressure Chemical Vapour Deposition

Pereira, L. / Aguas, H. / Raniero, L. et al. | British Library Online Contents | 2004