Crystallization of amorphous thin low pressure chemical vapour deposition silicon films: in situ TEM measurement of grain growth rates: Fid-Bau Portal

Crystallization of amorphous thin low pressure chemical vapour deposition silicon films: in situ TEM measurement of grain growth rates

Guillemet, J. P. / De Mauduit, B. / Pieraggi, B. / Campo, E.

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Crystallization of amorphous thin low pressure chemical vapour deposition silicon films: in situ TEM measurement of grain growth rates

Guillemet, J. P. / De Mauduit, B. / Pieraggi, B. / Campo, E.

Crystallization of amorphous thin low pressure chemical vapour deposition silicon films: in situ TEM measurement of grain growth rates

Guillemet, J. P. / De Mauduit, B. / Pieraggi, B. / Campo, E.

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Check availability in my library

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Document information

Title:

Crystallization of amorphous thin low pressure chemical vapour deposition silicon films: in situ TEM measurement of grain growth rates

Contributors:

Guillemet, J. P. (author) / De Mauduit, B. (author) / Pieraggi, B. (author) / Campo, E. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE LETTERS ; 12 ; 910

Publication date:

1993-01-01

Size:

910 pages

ISSN:

0261-8028

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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