Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
In-situ Auger electron spectroscopy of silicon thin films fabricated using ArF excimer laser-induced chemical vapor deposition and the oxidation process
In-situ Auger electron spectroscopy of silicon thin films fabricated using ArF excimer laser-induced chemical vapor deposition and the oxidation process
In-situ Auger electron spectroscopy of silicon thin films fabricated using ArF excimer laser-induced chemical vapor deposition and the oxidation process
Mutoh, K. (Autor:in) / Takeyama, S. (Autor:in) / Yamada, Y. (Autor:in) / Miyata, T. (Autor:in)
APPLIED SURFACE SCIENCE ; 79/80 ; 459
01.01.1994
459 pages
Aufsatz (Zeitschrift)
Unbekannt
DDC:
621.35
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Excimer-laser-induced chemical vapor deposition of boron nitride films from borazine [2547-37]
| British Library Conference Proceedings | 1995
Laser chemical vapor deposition of thin films
| British Library Online Contents | 1996
Excimer laser reactive ablation deposition of silicon nitride films
| British Library Online Contents | 1995
ArF-excimer laser induced chemical vapour deposition of amorphous hydrogenated SiGeC films
| British Library Online Contents | 2003
Excimer laser reactive deposition of vanadium nitride thin films
| British Library Online Contents | 2002