On the chemical vapour deposition of Ti~3SiC~2 from TiCl~4-SiCl~4-CH~4-H~2 gas mixtures. Part I A thermodynamic approach

Racault, C. / Langlais, F. / Bernard, C. | British Library Online Contents | 1994

Deposition rates of titanium nitride plates prepared by chemical vapour deposition of TiCl~4 + NH~3 system

Jiang, C.-C. / Goto, T. / Hirai, T. | British Library Online Contents | 1993

Catalytic systems based on TiCl~4/MgCl~2/SiCl~4~-~n(OR)~n for olefin polymerization

Parada, A. / Rajmankina, T. / Chirinos, J. J. et al. | British Library Online Contents | 2003

Polymorphism of Ti~3SiC~2

Yu, R. / Zhan, Q. / He, L. L. et al. | British Library Online Contents | 2002

Pressure-pulsed chemical vapour infiltration of SiC to porous carbon from a gas system SiCl~4-CH~4-H~2

Sugiyama, K. / Kishida, T. | British Library Online Contents | 1996