On the chemical vapour deposition of Ti~3SiC~2 from TiCl~4-SiCl~4-CH~4-H~2 gas mixtures: Part II An experimental approach: Fid-Bau Portal

On the chemical vapour deposition of Ti~3SiC~2 from TiCl~4-SiCl~4-CH~4-H~2 gas mixtures: Part II An experimental approach

Racault, C. / Langlais, F. / Naslain, R. / Kihn, Y.

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On the chemical vapour deposition of Ti~3SiC~2 from TiCl~4-SiCl~4-CH~4-H~2 gas mixtures: Part II An experimental approach

Racault, C. / Langlais, F. / Naslain, R. / Kihn, Y.

On the chemical vapour deposition of Ti~3SiC~2 from TiCl~4-SiCl~4-CH~4-H~2 gas mixtures: Part II An experimental approach

Racault, C. / Langlais, F. / Naslain, R. / Kihn, Y.

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Check availability in my library

Order at Subito €

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Document information

Title:

On the chemical vapour deposition of Ti~3SiC~2 from TiCl~4-SiCl~4-CH~4-H~2 gas mixtures: Part II An experimental approach

Contributors:

Racault, C. (author) / Langlais, F. (author) / Naslain, R. (author) / Kihn, Y. (author)

Published in:

JOURNAL OF MATERIALS SCIENCE ; 29 ; 3941

Publication date:

1994-01-01

Size:

3941 pages

ISSN:

0022-2461

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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