Characterization of adsorption in flow type atomic layer epitaxy reactor

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Erratum to ''GaAs surface passivation by plasma-enhanced atomic-layer-deposited aluminum nitride'' [Appl. Surf. Sci. 256 (2010) 7434-7437]

Bosund, M. / Mattila, P. / Aierken, A. et al. | British Library Online Contents | 2011

Atomic layer epitaxy of germanium

Sugahara, S. / Kitamura, T. / Imai, S. et al. | British Library Online Contents | 1994

Corrigendum to ''The properties of plasma-enhanced atomic layer deposition (ALD) ZnO thin films and comparison with thermal ALD'' [Appl. Surf. Sci. 257 (2011) 3776-3779]

Kim, D. / Kang, H. / Kim, J. M. et al. | British Library Online Contents | 2011

Corrigendum to ''Characterization of ZnO coated polyester fabrics for UV protection'' [Appl. Surf. Sci. 279 (2013) 272-278]

Broasca, G. / Borcia, G. / Dumitrascu, N. et al. | British Library Online Contents | 2013