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Control of the Stoichiometry of Thin Films by X-Ray Fluorescence Analysis
Control of the Stoichiometry of Thin Films by X-Ray Fluorescence Analysis
Control of the Stoichiometry of Thin Films by X-Ray Fluorescence Analysis
Trushin, O. S. (Autor:in) / Bochkarev, V. F. (Autor:in) / Mul, V. V. (Autor:in) / Naumov, V. V. (Autor:in)
INDUSTRIAL LABORATORY C/C OF ZAVODSKAIA LABORATORIIA ; 61 ; 466-468
01.01.1995
3 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
607.2
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