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Control of the Stoichiometry of Thin Films by X-Ray Fluorescence Analysis

Trushin, O. S. / Bochkarev, V. F. / Mul, V. V. / Naumov, V. V.

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Control of the Stoichiometry of Thin Films by X-Ray Fluorescence Analysis

Trushin, O. S. / Bochkarev, V. F. / Mul, V. V. / Naumov, V. V.

Control of the Stoichiometry of Thin Films by X-Ray Fluorescence Analysis

Trushin, O. S. / Bochkarev, V. F. / Mul, V. V. / Naumov, V. V.

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Check availability in my library

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Document information

Title:

Control of the Stoichiometry of Thin Films by X-Ray Fluorescence Analysis

Contributors:

Trushin, O. S. (author) / Bochkarev, V. F. (author) / Mul, V. V. (author) / Naumov, V. V. (author)

Published in:

INDUSTRIAL LABORATORY C/C OF ZAVODSKAIA LABORATORIIA ; 61 ; 466-468

Publication date:

1995-01-01

Size:

3 pages

ISSN:

0019-8447

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 607.2

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