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XPD study of atomic intermixing at the Ge/Si(001) interface
XPD study of atomic intermixing at the Ge/Si(001) interface
XPD study of atomic intermixing at the Ge/Si(001) interface
Davoli, I. (Autor:in) / Gunnella, R. (Autor:in) / Castrucci, P. (Autor:in) / Pinto, N. (Autor:in) / Bernardini, R. (Autor:in) / De Crescenzi, M. (Autor:in)
APPLIED SURFACE SCIENCE ; 102 ; 102-106
01.01.1996
5 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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