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Conventional EBIC versus MOS/EBIC study of electrically active defects in Si and SOI
Conventional EBIC versus MOS/EBIC study of electrically active defects in Si and SOI
Conventional EBIC versus MOS/EBIC study of electrically active defects in Si and SOI
Bondarenko, I. (Autor:in) / Kirk, H. (Autor:in) / Kononchuk, O. (Autor:in) / Rozgonyi, G. (Autor:in) / Balkanski, M. / Kamimura, H. / Mahajan, S.
01.01.1996
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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