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Infrared and Raman study of H-terminated Si(100) surfaces produced by etching solutions
Infrared and Raman study of H-terminated Si(100) surfaces produced by etching solutions
Infrared and Raman study of H-terminated Si(100) surfaces produced by etching solutions
Miyata, N. (Autor:in) / Watanabe, S. (Autor:in) / Okamura, S. (Autor:in)
APPLIED SURFACE SCIENCE ; 117/118 ; 26-31
01.01.1997
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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