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High Temperature X-Ray Diffraction Studies of the Phase Formation Process of Iridium Silicide Thin Films
High Temperature X-Ray Diffraction Studies of the Phase Formation Process of Iridium Silicide Thin Films
High Temperature X-Ray Diffraction Studies of the Phase Formation Process of Iridium Silicide Thin Films
Kurt, R. (Autor:in) / Pitschke, W. (Autor:in) / Heinrich, A. (Autor:in) / Wetzig, K. (Autor:in)
MATERIALS SCIENCE FORUM ; 278/281 ; 448-453
01.01.1998
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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