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Laser-induced mono-atomic-layer etching on Cl-adsorbed Si(111) surfaces
Laser-induced mono-atomic-layer etching on Cl-adsorbed Si(111) surfaces
Laser-induced mono-atomic-layer etching on Cl-adsorbed Si(111) surfaces
Iimori, T. (Autor:in) / Hattori, K. (Autor:in) / Shudo, K. (Autor:in) / Iwaki, T. (Autor:in) / Ueta, M. (Autor:in) / Komori, F. (Autor:in)
APPLIED SURFACE SCIENCE ; 130-132 ; 90-95
01.01.1998
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
621.35
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