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Organometallic Compounds as Precursors for Chemical Vapor Deposition of Thin Films of Inorganic Materials
Organometallic Compounds as Precursors for Chemical Vapor Deposition of Thin Films of Inorganic Materials
Organometallic Compounds as Precursors for Chemical Vapor Deposition of Thin Films of Inorganic Materials
Zanella, P. (Autor:in) / Battiston, G. A. (Autor:in) / Carta, G. (Autor:in) / Gerbasi, R. (Autor:in) / Porchia, M. (Autor:in) / Rossetto, G. (Autor:in) / Uskokovic, D. P. / Milonjic, S. K. / Rakovic, D. I.
01.01.1998
8 pages
Aufsatz (Zeitschrift)
Englisch
DDC:
620.11
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